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N. G. Rudawski, K. S. Jones, and R. Gwilliam, “Kinetics of stressed solid-phase epitaxial growth of ion-implanted Si,” International Conference on Ion-Implantation Technology (2008).
K. S. Jones, N. G. Rudawski, M. Phen, R. Gwilliam, and R. G. Elliman, “The effect of stress on ion implantation induced amorphous layer recrystallization,” (Invited Presentation) Materials Research Society Spring Meeting (2008).